PHYS 424 - Advanced Lithography and Dielectrics Nanofabrication - NMT 314

Institution:

Slippery Rock University of Pennsylvania

Subject:

Physics

Description:

This course covers all aspects of lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the lithographic process from substrate preparation to exposure. The second section examines the processes from development through inspection (both before and after pattern transfer). This section introduces optical masks, aligners, steppers and scanners. In addition, critical dimension (CD) and profile control of photoresists are investigated. The last section discusses advances in optical lithographic techniques such as phase shifting masks and illumination schemes as well as molecular ruler, e-beam, x-ray, EUV, and ion beam lithography.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Other

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.sru.edu

Phone Number:

(724) 738-9000

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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