ENGR 214 - Lithography for Nanofab

Institution:

Community College of Philadelphia

Subject:

Engineering

Description:

This course will cover all aspects of lithography from design and mask fabrication to pattern transfer and inspection. Topics covered will include substrate preparation, the nature and behavior of photoresist materials, exposure, optical masks, aligners, steppers, scanners, control of critical dimensions and profiles, and advanced optical lithography techniques.

Credits:

3.00

Credit Hours:

Prerequisites:

ENGR 210, ENGR 211 (Prerequisite or Corequisite), and ENGR 212 (Prerequisite or Corequisite)

Corequisites:

ENGR 213

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

2-2-3

Additional Information:

Historical Version(s):

Institution Website:

www.ccp.edu

Phone Number:

(215) 751-8000

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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