ENGR 213 - Thin Films in Nanofab

Institution:

Community College of Philadelphia

Subject:

Engineering

Description:

This course will cover thin film deposition and etching practices in nanofabrication. The deposition techniques covered will include atmospheric, low pressure, and plasma enhanced chemical vapor deposition. Materials to be considered will include dielectrics, polysilicon, metals, adhesion promoters and diffusion barriers. The second part of the course will focus on etching processes and will emphasize reactive ion etching, high-ion-density reactors, ion beam etching and wet chemical etching.

Credits:

3.00

Credit Hours:

Prerequisites:

ENGR 210, ENGR 211, and ENGR 212 (Prerequisite or Corequisite)

Corequisites:

ENGR 212 (Prerequisite or Corequisite)

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

2-2-3

Additional Information:

Historical Version(s):

Institution Website:

www.ccp.edu

Phone Number:

(215) 751-8000

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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