NFAB 214 - Lithography for Nanofabrication

Institution:

Harrisburg Area Community College-Harrisburg

Subject:

Nanofabrication

Description:

All aspects of lithography from design and mask fabrication to pattern transfer and inspection. The course is divided into three major sections. The first section describes the lithographic process from substrate preparation to exposure. The emphasis is on understanding the nature and behavior of photoresist materials. The second section examines the process from development through inspection (both before and after pattern transfer). This section introduces optical masks, aligners, steppers and scanners. In addition, critical dimension (CD) control and profile control of photoresists are investigated. The last section discusses advanced optical lighographic techniques such as phase-shifting masks and illumination schemes as well as e-bean, x-ray, extreme ultraviolet (EUV), and ion beam lithography. Prerequisite: Restricted, see program coordinator.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Multiple

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.hacc.edu

Phone Number:

(717) 780-2300

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

The Course Profile information is provided and updated by third parties including the respective institutions. While the institutions are able to update their information at any time, the information is not independently validated, and no party associated with this website can accept responsibility for its accuracy.