SMT 213 - Thin Films in Nanofabrication

Institution:

Lehigh Carbon Community College

Subject:

Nanofabrication

Description:

Covers thin film deposition and etching practices in nanofabrication. The deposition techniques to be included in the first part of the course will include atmospheric, low pressure, and plasma enhanced chemical vapor deposition and sputtinger, thermal evaporation, and beam evaporation physical vapor deposition. Materials to be considered will include dielectrics (nitride, oxide), polysilicon (doped and undoped), metals (aluminum, tungsten, copper), adhesion promoters and diffusion barriers. The second part of the course will focus on etching processes and will emphasize reactive ion etching (single, wafer, batch), high-ion-density reactors, ion beam etching and wet chemical etching. Students will receive hands-on experience in depositing and etching dielectric, semiconductor, and metal materials using state-of-the-art tools and practicing many of the steps critical to Nanofabrication of semiconductor devices, including microelectronics, MEMs devices, display structures, and structures used in the biotechnology fields.

Credits:

3.00

Credit Hours:

Prerequisites:

Corequisites:

Exclusions:

Level:

Instructional Type:

Lecture

Notes:

Additional Information:

Historical Version(s):

Institution Website:

www.lccc.edu

Phone Number:

(610) 799-2121

Regional Accreditation:

Middle States Association of Colleges and Schools

Calendar System:

Semester

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